Ion Implantation For Preparation Of Standards For Surface And Trace Analysis In Metals
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Determination of the concentration of heavy metals in waters
the water, foods and ecosystems (Ernst, 1996). Metals such as Cu, Pb and Zn are components of household garbage. Based on material-flow studies, a contribution of 50-80% of these metals may come from urban sewage (Boller, 1997). The quality of surface waters will depend on the type of waste released by many industrial processes. Tanneries
CHARACTERIZATION OF ION IMPLANTED SURFACES BY LASER INDUCED
constructed and optimized for spectrochemical analysis of solid materials. Specifically, the 2-D elemental distribution of Ge ions on silicon oxide surfaces, prepared by the method of ion implantation, with differing atomic concentrations between 1016 - 1017 ions/cm2 have been investigated by LIBS. For this purpose a Nd: YAG laser operating
Seasonal study of concentration of heavy metals in waters
trace elements probably originating in the soil, like Fe, Zn and Pb. There was a gradual increase in the concentrations of metals, in general, in the period of highest rainfall of the hydrographic network. Overall, except for Zn and Mn, the trace elements exceeded the maximum allowed value established by national legislation (CONAMA). Lower São
Microstructure of tool steel after low temperature ion nitriding
implantation system can be found elsewhere.8 To determine the elemental surface composition just after the ion implantation, XPS measurements were performed in a UHV chamber attached to the nitriding chamber by a VG-CLAM-2 electron energy analyzer using a non-monochromatic Al K radiation and following the procedure described by Hüfner.
Advances in Wafer Analysis by VPD ICP-MS
surface and at the bevel edge Ion Implantation Metal contamination on a wafer may arise from ion beam sputtering of exposed surfaces, such as wafer clamps and apertures. The surface metals may be monitored using VPD ICP-MS, a survey technique capable of monitoring 30 elements or more on the wafer surface.
Nitrogen incorporation and trace element analysis of
Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin ﬁlms by secondary ion mass spectrometry D. Zhoua),b) Advanced Materials Processing and Analysis Center, University of Central Florida, Orlando, Florida 32816 F. A. Stevie Cirent Semiconductor, Orlando, Florida 32819 L. Chowc)
Secondary Ion Mass Spectroscopy - NASA
Secondary Ion Mass Spectroscopy Binayak Panda, Ph.D., P.E., Material and Processes Laboratory, Marshall Space Flight Center General Uses Surface compositional analysis with approximately 5 -to l 0 nm depth resolution In-depth concentration profiling Trace element analysis at the parts per million to parts per trillion range
University of Wollongong Thesis Collection University of
Immersion Ion Implantation (PI3) and Physical Vapor Deposition (PVD) coating, rendered it the most suitable contender for proof dies. The Viking tool steel was subsequently treated/coated by PI (a non-line-of-sight nitrogen implantation process developed by Australian Nuclear Science and Technology
Decoupling of optoelectronic properties from morphological
A surface sputter depth proﬁle was conducted by Ar+ sputtering at 0.5keV for 60s the ﬁrst 5min and for 300s after 5min before each acquisition. The preparation of atom probe tomography (APT) specimens was carried out using a dual-beam focused-ion-beam (FIB, FEI Helios Nanolab 600i), according to the lift-out technique in Thompson et al. (2007).
Sanjay Ghodawat University Kolhapur Maharashtra, India
quality analysis (IS: 3025 and IS: 1622), Drinking water standards BIS & WHO guidelines. Health significance of Fluoride, Nitrates and heavy metals like Mercury, Cadmium, Arsenic etc and toxic / trace organics, water borne diseases, Objectives of Water Treatment, Flow chart of treatment units,
BU - CiteSeerX
sputtering, ion beam assisted deposition (IBAD), post-deposition ion mixing or implantation, and laser ablation or processing. Various parametric studies have been done with each type of deposition, and optimum operating conditions (knob settings) have been identified for lowest friction and lowest wear rates.
Zn-alloy provides a novel platform for mechanically stable
sputtering with argon ions for 60 s, 180 s, and 300 s. The argon ion energy was 2 keV and a current of 3 μA was applied onto a surface area of 25 mm2, resulting in an estimated sputter rate of 6 nm/min. As a result, the recorded spectra corresponded to a depth of 6 nm (60 s sput-tering), 18 nm (180 s sputtering), and 30 nm (300 s sputtering).