Capillary Discharge Sources Of Hard UV Radiation

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Irradiation Effects on EUV Nanolithography Collector Mirrors

2. EUV radiation sources There are numerous sources designed to generate light at the extreme ultraviolet line of 13.5-nm. Historically advanced lithography has considered wavelength ranges from hard X-rays up to 157 nm [Bakshi, 2009]. Radiators of 13.5-nm light rely on high-density plasma

1) LC/MS in food safety: Target and Non-target analysis 2) GC

UV Lamp Counter-current nitrogen Atmospheric Photo Ionization (APPI) Source is very similar to APCI, only the discharge needle is replaced by the UV Lamp. Ionization process is initiated by the krypton lamp emmiting photons with 10 eV. Photons may ionize only compounds with ionization energy less than 10 eV (most of

Components of a Mass Spectrometer

Hard (high energy) ionization and Soft (low energy) ionization Electron Ionization (EI) Chemical (CI) Spray Ionization (APCI, APPI, ESI) Desorption Ionization (FAB, MALDI, SALDI) Gas discharge ion sources (e.g. Inductively Couple Plasma) Ambient Ionization (DESI, LAESI)

Applied Chemistry: 3rd Semester Detailed Syllabus

Pollution and pollutants-sources, types and consequences.Air and Water pollution, solid wastes.Imbalance in atmosphere, Hydrosphere and Lithosphere.Industrial Effluents. Industrial Episodes of hazards and pollution: Minamata, Love canal, Flixborough, Bhopal , Chernobyl. Elements of hazards and toxicity, tixilogy.

Background: Short wavelength radiation has been used in

Some sources studied either theoretically, experimentally or both: Microfocus Laser-generated plasmas Discharge plasmas Pinch plasmas Table-top high-rep rate EUV and soft X-ray lasers Capillary soft X-ray lasers High harmonic generation Thomson back-scatter Laser wakefield Transition radiation


of sources developed in the laboratory for EUV metrology and lithography,ordevotedtox-raydiagnosticofpolyphasicmedia and hard x-ray cineradiography. 2. XUV-EUV capillary discharge sources The foremost critical issue of EUV lithography is the hunt for an efficient, compact, stable and debris-free EUV source.

Damage and ablation of large band gap dielectrics induced by

the laser radiation. The measurements were performed using the strongly saturated 46.9 nm, 0.3 mJ, 1.7 ns soft X-ray laser source pumped by a fast capillary discharge in a pure Ar gas 11,13. The laser beam had annular structure with divergence of 5 mrad and was focused on the samples by a 12 cm-focal-

Kapteyn full CV 2013 mm update March 2014 - JILA

Popmintchev, Brandan Reagan High-Order Harmonic Generation in a Capillary Discharge, US Patent #7,729,403, June 1, 2010. Oren Cohen, Henry C. Kapteyn, and Margaret M. Murnane, Phase matching of high order harmonic generation using dynamic phase modulation caused by a non-collinear modulation pulse, US Patent


Sources of NOx are combustion processes (power generation, transportation, biomass burning, wild fires), soil emissions, lightning and photochemical production from N2O in the stratosphere. The most important sources of NOx to the upper troposphere are lightning, transport from the boundary layer


Microdischarges in capillary tubes can serve as sources of intense UV radiation. Excimer emission in argon (Ar2 *) at 128 nm has been studied by vacuum UV spectroscopy. A method to increase the on-axis excimer radiation is demonstrated by adding discharges in

Next Generation Light Sources and Future Applications

duration laser pulse in a 3.3-cm-long gas- lled capillary discharge waveguide has been demonstrated in Lawrence Berkeley National Laboratory[27]. The 30 pC witness beam charge has not reached the expectation of 1 nC. There-fore, scientists have proposed employment of higher gas density and Petawatt ultrashort (˘5 fs) laser[28].

First EUV contact lithography experiments for the coloration

Coloration of alkali halide crystals (salt) by ionizing radiation Salts are transparent in VIS, UV and near IR. Ionizing radiation like EUV, X-rays, electrons, protons, etc., can change the salt structure generating color centers

ENEA EUV Discharge Produced Plasma Source: Diagnostics

ENEA EUV Discharge Produced Plasma Source Luca Mezi evolution of this voltage is reported in Fig. 1, together with the Rogowski coil measured main discharge current and the emitted EUV radiation pulse. Figure 1: Temporal evolution of the HV V 1 on the capacitor which feeds the main discharge, of the main discharge current I

Deuterium lamp Layout NEWEST

that the discharge only occurs between the anode and the cathode, as well as preventing the less stable cathode glow radiation escaping from the lamp. Inside the box structure in separate compartments are a triple oxide cathode, consisting of barium, strontium and calcium mixed oxide, and the anode which is usually a flat molybdenum plate.

A perspective on bio-inspired interfacial systems for solar

brine discharge, high fouling potential, and formation of toxic disinfection by-products.[2,12] As for the purification of contaminated water, the conventional approach involves the addition of different kinds of chemicals to polluted water to remove toxic substances, which the production of clean water may not be promised for edible standard.

Alternative Coherent X -ray Sources - DESY

Capillary discharges paving way to high-rep rate, table-top sources Slab target 2-20 mm Driving Laser Line Focus Plasma column X-rays X-rays ~few 100 mm diameter See R.London Phys. Fluids B 5 2707 (1993), J.Rocca Rev. Sci. Inst 70 3799 (1999)


Radiant Energy Sources: Materials which can be excited to high energy states by a high voltage electric discharge (or) by electrical heating serve as excellent radiant energy sources. Sources of Ultraviolet radiation: Most commonly used sources of UV radiation are the hydrogen lamp and the deuterium lamp.

Control And Stabilization Of Laser Plasmasources For Euv

These sources consist of a small (30 µm diameter) droplet which is excited into plasma emitting EUV around 13.5 nm, the industry s chosen wavelength for EUV lithography (EUVL). These sources are the best candidates for the commercialization of EUVL allowing mass production of computer chips with 32 nm or even smaller feature size.

Physik und Anwendungen von weicher Röntgenstrahlung I

Sources : Introduction to Synchrotron Radiation, Wigglers and Undulators Basics of the Free Electron Laser (FEL) Laser Plasma (LIP) and discharge plasma (DPP) sources X-ray lasers, High Harmonics Nanooptics and diffractive optics Diffractive optics, amplitude and phase gratings Zoneplates and refractive optics

Biographical Sketch Henry Cornelius Kapteyn - JILA

Program Committee, Applications of High Field and Short Wavelength Sources IX, Palm Springs, CA 2001. Chair, Physics Department Evaluation Committee, 2000 2001. Member, Program Review Panel Department of Energy, J. R. MacDonald Laboratory, Kansas State University, Oct. 2000.


2.2 UV-radiation 2.3 Surface treatment 2.4 Electrostatic precipitation 2.5 Gas 1 aser The pseudo spark-switch - a ßIldern plasma application (G. Ecker) 1. Plasma technology and switch gear 2. Typical discharges of gaseaus electronics 3. Characteristica of the pseudo spark 4. Operation and data of the pseudo spark discharge 5.

Agilent 1260 Infinity Diode Array and Multiple Wavelength

filament of the tungsten lamp is focused on the discharge aperture of the deuterium lamp by means of a special rear-access lamp design which allows both light sources to be optically combined and share a common axis to the source lens. The achromat (source lens) forms a single, focused beam of light through the flow cell.

hollow cathode discharge gun served as an efficient source of vacuum ultraviolet (UV) radiation was explored [16], and an rf discharge needle developed and performed in a small area


seen in fig. 2. In our preceding study [2], (V)UV-radiation was identified as a means of an energy transfer from the APPJ s discharge region, possibly generating surplus atomic oxygen in the effluent. (V)UV radiation and accordingly its effect on the atomic oxygen density is strongest close to the nozzle.

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AMC, their sources and effects on wafers Identify the AMC effects on Wafers through witness wafer analysis Particle identification on wafer surface Material outgassing analysis and evaluation by TD-GCMS RoHS and REACH Compliance Tests Cadmium, Mercury, Lead, Chromium by ICP-OES Hexavalent Chromium by UV-VIS